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Model 30
$7,800.00
Model 30 – UV Collimated Lightsource
Standalone or integrated into any mask aligner or exposure system• Available with near, mid, or deep UV
- Mercury Arc and Mercury Xenon lamps
- Highly uniform beam at exposure plain
- Low collimation half angle
- Power up to 12.5 kw
- Pictured with optional stand
- Optional Single Level Tooling Module
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Model 2012
$56,700.00Add to cartModel 2012 – 300mm Optical Edge or Flood Exposure System
• Handles 200 or 300mm wafers (8” -12”)
• Has automated foup loading or cassette to cassette handling
• Up to 8kw Collimated Beam Light Source
• Bar code reader and remote diagnostic
• Semi safety compliant
• Windows graphic user interface
• Remote diagnostics -
Model 800E
$87,990.00Add to cartModel 800E – Semi-Automated Mask Aligner for Front or Backside Mask Alignment
- 3-point automatic wafer leveling
- Windows 10 operating system with unlimited recipe storage
- Remote diagnostics
- Motorized joy stick: allows fast mode to target and precise mode for precision alignment
- One touch from standard view to wide angle view with
- no resolution loss
- IR lamp kit available
- Optional UV LED upgrade
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Hast
$45,000.00Add to cartThe Standard design is safer,
and the inner arc design
prevents condensation and
dripping, which complies with
national safety container
regulations
• Multiple protection functions, two
high-temperature protection
devices, humidity water cutoff
protection, and overpressure
protection
• Higher stability: equipped with
self-developed PIO control
algorithm.ensuring the accuracy
of temperature,humidity and
pressure values
• Humidity free selection:
saturation and unsaturation free
setting
• High intelligence: USB data,
curve export and save function -
Model 6000
$55,000.00Add to cartModel 6000 – Fully Automated Mask Aligner for High Volume Production
- Flexibility to handle wafer sizes 4” (100mm) to 12” (300mm)
- Highly optimized yields (200 wph in 1st mask mode)
- Cognix Vision Pro with customized software
- Automatic Wedge Effect Leveling
- Unlimited recipe storage
- Superb process repeatability
- Cluster tool integration
- Front and backside alignment
- Accurate top to bottom auto alignment
- Optional UV LED upgrade
- Optional SECS/GEM Interface upgrade
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UV-Litho-ACA
$550.00Add to cart- Minimum Line width: 1.0um
- Minimum Feature size: 0.8 um
- Writing Speed: 3 mm2/min @ 1um
- 20mm2/min @ 1.5um
- Light source: LED 405nm / 385nm
- XY distance: 55mm
- Overlay Accuracy: 350nm
- minimum sample size: 3mm x 3mm
- Maximum sample size: 150mm x 150 mm
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