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Model 30
$7,800.00
Model 30 – UV Collimated Lightsource
Standalone or integrated into any mask aligner or exposure system• Available with near, mid, or deep UV
- Mercury Arc and Mercury Xenon lamps
- Highly uniform beam at exposure plain
- Low collimation half angle
- Power up to 12.5 kw
- Pictured with optional stand
- Optional Single Level Tooling Module
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- 20mm2/min @ 1.5um
- Light source: LED 405nm / 385nm
- XY distance: 55mm
- Overlay Accuracy: 350nm
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- Maximum sample size: 150mm x 150 mm
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Model 32
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For demanding applications. Standalone or integrated intoan OAI lithography system
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TriSOL Standard Class AAA (TSS)
$6,900.00Add to cart- Delivers highly collimated uniform light output rated 350W- 5,000W
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- Repeatable reliable constant output, & measurement uniformity
- Rotation beam output can be configured in downward, vertical, horizontal or 360 degree rotation
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- Optional pipe adapter for CPV
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Model 6020
$56,000.00Add to cartModel 6020 – Large Substrate ExposureSystem for RDL Panel Level PKG or Glass Panels
- 1st level exposure prints mask on substrates
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- Lamp power 8kw
- Stand alone system or fully integrated into customer’s line
- Available with robotic handling
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Model 800E
$87,990.00Add to cartModel 800E – Semi-Automated Mask Aligner for Front or Backside Mask Alignment
- 3-point automatic wafer leveling
- Windows 10 operating system with unlimited recipe storage
- Remote diagnostics
- Motorized joy stick: allows fast mode to target and precise mode for precision alignment
- One touch from standard view to wide angle view with
- no resolution loss
- IR lamp kit available
- Optional UV LED upgrade
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